High vacuum magnetron sputtering coating system

1. magnetron sputtering principle:

Magnetron sputtering is a more commonly used physical deposition method. Magnetron sputtering in a vacuum chamber, the use of low-pressure gas discharge phenomenon, so that ions in the plasma bombard the target surface state, and a ring-shaped magnetic field to control a glow discharge, so that sputtered particles are deposited on a substrate. Magnetron sputtering can be easily coated film made of high melting point substance layer, on a large area can be made uniform plated film. 

2. magnetron sputtering process:

In the coating process, the selection process has an important effect on the properties of the films, according to the principle of magnetron sputtering technique, combined with the practical application of the device, the requirements of the film thickness in the range of magnitude of nm ~ μm, a thickness of <550nm, e.g. there are light interference effects, are the film category, usually called optical film technology.

3. magnetron sputtering characteristics: high sputtering rate, high deposition rate. Target sputtering source with a strong DIY select combinations.

Magnetron sputtering cathode source is an ideal controlled source, the thickness of the deposited film sputtering source of power or discharge current has a good linear correlation, so there is a good controllability, can better mass production consistency and repeatability. Sputter source can ideally placed in a vacuum chamber for a long time stability, access to pure film, vacuum coating to improve the adhesion of the film to ensure quality.

4. Get a high vacuum magnetron sputtering:

Vacuum is the absence of a state space of any substance, is a physical phenomenon. In the "vacuum", the sound can not be delivered because there is no media, but the transfer was not affected by electromagnetic vacuum. In fact, in the vacuum technology, the vacuum for the gas concerned, in general, to obtain a high vacuum by an oil diffusion pump, an oil diffusion pump capable of obtaining a higher degree of vacuum than the mechanical pump