Magnetron vacuum coating off the radiation source moving magnetic field improvements

Moving magnetic field in the magnetron vacuum coating off radiation source, the improvement comprising a vacuum deposition chamber in front of the target substrate, the target portion of the substrate front side and covering the target target outer circumferential side of the substrate shielding ring, fixed to the front of the sheet-like target substrate the target, the target substrate side in the direction toward the center position of the magnet mounted on the magnet substrate, the substrate disposed within the annular magnet and the circumferential position of the target substrate on the back of the outer magnet combination.
Improvements:
Magnet substrate: the radius is smaller than the target diameter greater than the diameter of the target, a magnet is fixed to the substrate deviates from the target substrate side spur gear axis, mounted on the spur gear engaging the rack plating a magnetic ring, a gear mounted on the turn handle , the rear side of the installation located spur gear motor, the motor power output shaft and a ring gear coaxial with the target substrate disposed on the frame, the motor drive output shaft Shui shank.
Effect: to improve the utilization targets, improved coating quality. An annular magnetic energy revolution and rotation, enough to scan to any part of the target, so the target is even larger area off the shot.
Summarize this vacuum coating process moving magnetic field magnetron off radiation source characteristics:
1. magnet substrate axis offset from the axis of the target substrate distance plus the radius of the magnet substrate and the target is equal to or close to the length of the radius.
2. Install the vacuum coating machine rack and spur gear ring mounted rear gear motors located directly on the rack, gear shaft is mounted on the turn the handle, turn the motor power output shaft fixed handle, magnet the substrate being fixed to a side surface of the gear, the radius of the magnet diameter greater than the target substrate is less than the diameter of the target, the substrate magnet axis offset from the axis of the target substrate.
3. The ring gear and the target board and motor power output shaft coaxial settings.
4.The ring gear pitch diameter minus the inner magnet pitch circle diameter equal to or greater than the inner diameter of the magnet