The principle of PVD coating technology

The principle of PVD coating technology

PVD is English Physical Vapor Deposition, in Chinese means "Physical Vapor Deposition", is refers to under the condition of vacuum, use Physical method to make material preparation technology of thin film deposited on the plated workpiece.
2. The PVD coating and PVD coating machine:
PVD (physical vapor deposition) coating technology is mainly divided into three categories, vacuum evaporation coating, vacuum... sputtering plating and vacuum ion plating. Corresponding to the three categories of PVD technology, the corresponding also have vacuum evaporation coating machine for vacuum coating equipment, vacuum sputtering coating machine and vacuum ion coating machine of the three. For nearly 10 years, the development of the vacuum ion plating technology is the fastest, it has become one of today's most advanced surface treatment method. We usually say of PVD coating, is refers to the vacuum ion plating; Commonly referred to as PVD coating machine, namely vacuum ion coating machine.
3. PVD coating, ion plating technology, its particular principle is under the condition of vacuum, with low voltage, high current arc discharge technology, by use of gas discharge from target material evaporation and evaporation occurs matter and gas ionization, using electric field acceleration, cause the evaporation material and the reaction product deposition on the workpiece.
4. The characteristics of PVD coating membrane layer, use the PVD coating technology of plating layer, high hardness, high wear resistance, low coefficient of friction), good corrosion resistance and chemical stability, etc, membrane layer of longer life; Membrane layer can greatly improve the appearance of artifacts decorative performance.