Using electric arc ion plating technology, multi arc ion plating equipment with high ionization rate, fast deposition rate, high space utilization, the advantages of the structure is relatively simple, but its deposit exists big particle size, more for decorative plating, and the arc ion plating technology better solved the problems of large size particles, but also improves the utilization of target material and dimensional accuracy in plasma. Its surface quality can be and magnetron sputtering (magnetron sputtering coating equipment) was comparable to that target surface can evenly evaporation, the utilization rate of target material greatly improved; Additional pulse bias, further reducing the deposition temperature, and the multiple target combination technology development and use of precise control of nanoscale thickness and so on to make moulds, cutlery vacuum coating machine almost to the only proper thickness, composition, what the point of hard film can be plated.
Hired a domestic vacuum industry composed of senior experts and senior engineers a powerful r&d team, the vacuum plating equipment layer membrane composition, organization, structure, thickness, the application and the roughness of the basement effect on the properties of film layer and the tool, and its study on the relationship between the vacuum plating process is very thorough, the factory mold, cutting tool vacuum coating machine, vacuum plating chamber vacuum sealing and interior design of the moving parts and materials, give full consideration to the affordable, configuration more efficient circular arc evaporation source only, also can match more than hollow cathode gun, at the same time destroy configuration of impact resistance excellent performance arc bias power supply, the guarantee enough plasma density and reactivity, increase the density of the film and binding force, it can be three dimensional motion artifacts and improve the uniformity of the film.
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